Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1981-06-01
1982-05-25
Massie, Jerome W.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156644, 1566591, 427 431, 430 5, 430296, 430313, 430319, B05D 306
Patent
active
043315054
ABSTRACT:
A method of manufacturing an electron emission aperture of an electron beam generator using the associated electron beam generator and the cathode of the generator which emits electrons at a plurality of points, as well as aperture lenses, and employing electron projection lithography. The associated electron beams are used to burn the emission spot pattern of the associated cathode into an electron-sensitive layer of a blank of a perforated mask, through holes in the mask are produced by etching at the burn spots, individual aperture spots corresponding to the emission spot pattern are burned into an electron-sensitive layer of a blank of the aperture through the through holes using the perforated mask and the associated electron beams, and the blind holes near the spots are etched allowing their individual apertures and a supporting grid to remain.
REFERENCES:
patent: 3971860 (1976-07-01), Broers et al.
patent: 3996468 (1976-12-01), Fletcher
patent: 4119688 (1978-10-01), Hiraoka
patent: 4293374 (1981-10-01), Chaudhari et al.
Krakow et al. "Microgrids . . . Microscopy" IBM Technical Disclosure Bull., vol. 23, No. 5 (10/80) p. 2140.
Bowden et al. "Electron . . . Lithography" CRC Critical Reviews in Solid State Sciences Feb. 1979, pp. 224-264.
Levine Alan H.
Man Maschinenfabrik Augsburg-Nurnburg A.G.
Massie Jerome W.
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