Method for manufacturing a workpiece using a magnetron...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Reexamination Certificate

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Details

C204S298110, C204S298180, C204S192120, C204S192200

Reexamination Certificate

active

06860977

ABSTRACT:
A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.

REFERENCES:
patent: 5262028 (1993-11-01), Manley
patent: 5284564 (1994-02-01), Maass
patent: 5688381 (1997-11-01), Grunenfelder
patent: 6352629 (2002-03-01), Wang
patent: 0 393 957 (1990-10-01), None

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