Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-03-01
2005-03-01
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298110, C204S298180, C204S192120, C204S192200
Reexamination Certificate
active
06860977
ABSTRACT:
A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.
REFERENCES:
patent: 5262028 (1993-11-01), Manley
patent: 5284564 (1994-02-01), Maass
patent: 5688381 (1997-11-01), Grunenfelder
patent: 6352629 (2002-03-01), Wang
patent: 0 393 957 (1990-10-01), None
Dubs Martin
Eisenhammer Thomas
Grunenfelder Pius
Haag Walter
Heinz Bernd
McDonald Rodney G.
Notaro & Michalos P.C.
Unaxis Balzers Limited
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