Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-03-10
1988-06-07
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041922, C23C 1434
Patent
active
047494590
ABSTRACT:
A film of magnetic recording media is formed by sputtering an alloy of cobalt and platinum onto a substrate. The sputtering takes place in a chamber containing argon and nitrogen. The magnetic coercivity of the resulting film is controlled by varying the concentration of nitrogen in the sputtering chamber. By using this technique, the film coercivity is controlled without varying other important parameters such as the saturation magnetization.
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Chen Tu
Shir Ching-Cheng
Yamashita Tsutomu T.
Komag, Inc.
Leeds Kenneth E.
MacPherson Alan H.
Nguyen Nam X.
Niebling John F.
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