Method for manufacturing a thin film actuatable mirror array hav

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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427100, 4271033, 216 13, 216 67, 216 72, 359295, B05D 512, H05H 124, G02B 2600

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active

061363901

ABSTRACT:
An inventive method for manufacturing an array of M.times.N thin film actuatable mirrors, the method being capable of preserving the structural integrity thereof, comprises the steps of: preparing an active matrix; depositing a passivation layer and an etchant stopping layer, successively, on top of the active matrix; forming a thin film sacrificial layer; depositing a first mask layer made of a silicon oxide; forming a second mask layer; forming an array of M.times.N pair of cavities, one of the cavities in each pair exposing a portion of one of the connecting terminals; removing the first and the second mask layer; forming an array of M.times.N actuating structures; removing the thin film sacrificial layer to thereby form the array of M.times.N thin film actuatable mirrors. During the formation of the cavities, the cavities is formed into a trapezoidal shape as a result of the difference in the etching rate between the first mask layer and the thin film sacrificial layer.

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