Method for manufacturing a semiconductor device

Details Method for manufacturing a semiconductor device Method for manufacturing a semiconductor device

1997-02-12

2000-03-28

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430319, 430396, G03F 700

Patent

active

060430001

ABSTRACT:
A method for manufacturing a liquid crystal display, includes the steps of forming a first metal layer on a transparent substrate, forming a first photo-resist pattern on the first metal layer by using a first mask with a predetermined pattern, forming a gate electrode by etching the first metal layer using the first photo-resist pattern, forming a second metal layer over the gate electrode, forming a second photo-resist pattern on the second metal layer by using a second mask having a line-and-space pattern whose space width is smaller than a resolution of an exposure system, forming source and drain electrodes by etching the second metal layer using the second photo-resist pattern, and forming a transparent conductive material layer for electrically connecting the drain electrode with a pixel electrode.

REFERENCES:
patent: 5731109 (1998-03-01), Hwang

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