Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2009-04-08
2010-11-23
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S270100, C430S314000, C430S317000, C430S905000, C430S907000, C430S910000
Reexamination Certificate
active
07838201
ABSTRACT:
A polymer for immersion lithography comprising a repeating unit represented by Formula 1 and a photoresist composition containing the same. A photoresist film formed by the photoresist composition of the invention is highly resistant to dissolution, a photoacid generator in an aqueous solution for immersion lithography, thereby preventing contamination of an exposure lens and deformation of the photoresist pattern by exposure.
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Bok Cheol Kyu
Jung Jae Chang
Lim Chang Moon
Moon Seung Chan
Chu John S
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
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