Method for manufacturing a semiconductor device

Details Method for manufacturing a semiconductor device Method for manufacturing a semiconductor device

2008-03-04

2008-03-04

Geyer, Scott B. (Department: 2822)

Semiconductor device manufacturing: process

Forming bipolar transistor by formation or alteration of...

Self-aligned

C438S519000, C438S542000, C438S548000

Reexamination Certificate

active

11039857

ABSTRACT:
A method for forming a semiconductor memory device includes the steps of: implanting a dopant in a semiconductor substrate; heat treating the semiconductor substrate in an oxidizing ambient to diffuse the dopant for forming diffused regions in the semiconductor substrate; and forming memory cells each including a MOS transistor having the diffused regions as source/drain regions.

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