Method for manufacturing a Schottky-type rectifier having contro

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437176, 437177, 437178, 437179, 357 15, 357 67, 357 71, 148DIG139, 148DIG140, H01L 2100, H01L 2102, H01L 21283, H01L 21285

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049468030

ABSTRACT:
A Schottky-type diode is fabricated by a process that enables the diodes conductor-to-semiconductor barrier height .phi..sub.B to be controlled by adjusting the thickness of a metal silicide layer (22) which forms a rectifying junction (20) with an N-type semiconductor (24). In fabricating one version of the diode, a metallic layer (70) consisting of two or more metals such as platinum and nickel is deposited on an N-type silicon semiconductor (68) and heated to create a metal silicide layer (72) consisting of a lower layer (62) and an upper layer (74) of different average composition. A portion of the upper layer is then removed, allowing .phi..sub.B to be adjusted suitably.

REFERENCES:
patent: 3855612 (1974-12-01), Rosvold
patent: 3938243 (1976-02-01), Rosvold
patent: 3964084 (1976-06-01), Andrews, Jr. et al.
patent: 4201999 (1980-05-01), Howard et al.
patent: 4816879 (1989-03-01), Ellwanger
van Gurp, G., Aluminum-Silicide Reactions II. Schottky-Barrier Height, J. Appl. Phys. 50(11), Nov. 1979, pp. 6923-6926.
Stolt, L., Variation of PtSi-nSi Barrier Height with Fabrication Parameters, and Characterization of the Electrical Behavior of the Junction, Physica Scripta, vol. 18, 1978 (Dec.), pp. 410-412.

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