Method for manufacturing a narrow line of photosensitive materia

Details Method for manufacturing a narrow line of photosensitive materia Method for manufacturing a narrow line of photosensitive materia

1985-12-23

1986-12-23

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

29571, 148187, 156653, 156656, 156657, 156665, 430317, 430318, B44C 122, B29C 1708, C03C 1500, C23F 102

Patent

active

046311130

ABSTRACT:
A portion (28) of photosensitive material is created by an underetching/shadowing technique in such a manner as to have an extremely narrow width.

REFERENCES:
patent: 3537925 (1970-11-01), Chen
patent: 3721592 (1973-03-01), De Werdt
patent: 3958040 (1976-05-01), Webb
patent: 4093503 (1978-06-01), Harris et al.
patent: 4313782 (1982-02-01), Sokoloski
patent: 4354896 (1982-10-01), Hunter et al.

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