Method for manufacturing a microstructure, exposure device,...

Details Method for manufacturing a microstructure, exposure device,... Method for manufacturing a microstructure, exposure device,...

2011-01-11

2011-01-11

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S022000

Reexamination Certificate

active

07867692

ABSTRACT:
Aspects of the invention can provide a method for manufacturing a microstructure, including forming a photosensitive film above a work piece, exposing the photosensitive film, as a first exposure, by irradiating interference light generated by intersecting two laser beams having a wavelength shorter than a wavelength of visible light, developing the exposed photosensitive film so as to develop a shape corresponding to a pattern of the interference light to the photosensitive film, and etching the work piece using the developed photosensitive film as an etching mask.

REFERENCES:
patent: 4996120 (1991-02-01), Smothers et al.
patent: 5415835 (1995-05-01), Brueck et al.
patent: 5759744 (1998-06-01), Brueck et al.
patent: 5885753 (1999-03-01), Crooks et al.
patent: 6074800 (2000-06-01), Breyta et al.
patent: 6122103 (2000-09-01), Perkins et al.
patent: 6218292 (2001-04-01), Foote
patent: 6243199 (2001-06-01), Hansen et al.
patent: 6243348 (2001-06-01), Goodberlet
patent: 6548820 (2003-04-01), Mermelstein
patent: 6882477 (2005-04-01), Schattenburg et al.
patent: 2002/0105628 (2002-08-01), Saito et al.
patent: 2006/0109532 (2006-05-01), Savas et al.
patent: 0 939 343 (1999-09-01), None
patent: A 58-154285 (1983-09-01), None
patent: A-06-053122 (1994-02-01), None
patent: A-06-300909 (1994-10-01), None
patent: A-07-159609 (1995-06-01), None
patent: A-07-263321 (1995-10-01), None
patent: A 11-26344 (1999-01-01), None
patent: A-11-345758 (1999-12-01), None
patent: 2001-033982 (2001-09-01), None
patent: B1-10-0400893 (1995-12-01), None
patent: 445512 (2001-07-01), None
patent: WO 01/35168 (2001-05-01), None
Deguchi et al., “Nanofabrication Techniques Using X-Rays,” Japan Society of Applied Physics, vol. 73, No. 4, pp. 455-461, 2004 with partial translation.

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