Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2006-08-08
2006-08-08
Norton, Nadine (Department: 1765)
Etching a substrate: processes
Forming or treating optical article
C216S026000
Reexamination Certificate
active
07087180
ABSTRACT:
Disclosed herein is a method for manufacturing a microlens substrate which is excellent in chemical resistance and light fastness to intense light irradiation, and is capable of forming a microlens substrate of a high accuracy of form. The method includes the steps of: forming a lens-shaped curve at a surface side of a transparent substrate; forming an inorganic material film on the transparent substrate so as to bury the curve therewith; and planarizing the surface of the inorganic material film to provide a microlens where the curve is buried with the inorganic material film.
REFERENCES:
patent: 5734190 (1998-03-01), Hawkins et al.
patent: 2001/0026346 (2001-10-01), Nagasako
patent: 2004/0082096 (2004-04-01), Yamamoto
Abe Moriaki
Hasegawa Shoji
Kaise Kikuo
Shinoda Kazuhiro
Norton Nadine
Sonnenschein Nath & Rosenthal LLP
Tran Binh X.
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