Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1983-01-31
1985-04-09
Lawrence, Evan K.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430314, 430319, B05D 500, H01F 1006
Patent
active
045102317
ABSTRACT:
A conductor pattern and an ion implanting mask are simultaneously formed by photoetching a conductor film through a single photoresist pattern. An area on which a conductor pattern is to be formed is covered with a photoresist, and ions are implanted to a magnetic film using the conductor film portion not convered with the photoresist, to form a magnetic bubble propagation track. The ion implantation mask and the conductor pattern are formed simultaneously through one mask. Accordingly, reduction of accuracy due to an error in mask alignment is prevented and the manufacturing is facilitated.
REFERENCES:
patent: 4098917 (1978-07-01), Bullock et al.
Kodama Naoki
Sugita Yutaka
Suzuki Ryo
Takeshita Masatoshi
Takeuchi Teruaki
Hitachi , Ltd.
Lawrence Evan K.
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