Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate
2006-02-09
2009-06-30
Richards, N Drew (Department: 2822)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
C438S159000, C438S623000
Reexamination Certificate
active
07553707
ABSTRACT:
The invention provides a novel technology where a TFT array substrate for a display device is formed with three photomasks. The invention is achieved by using the novel technology in combination with a well-known four-masks process. For the novel technology, during the lithography process where a photosensitive acrylic resin film is used to make contacts, taper patterns required for general through holes are formed simultaneously with a fine pattern formed in a light shielding area that is tapered more approximately to vertical, using a photomask with phase-shift effect. Thus the pixel electrode pattern can be separated without using lithography process in subsequent processes.
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Chinese Office Action of Mar. 23, 2007.
Horino Shigekazu
Tseng Hsien-kai
Tung Chun-hao
Duong Khanh B
Martine & Penilla & Gencarella LLP
Quanta Display Inc.
Quanta Display Japan Inc.
Richards N Drew
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