Method for manufacturing a light guide plate mold and a...

Details Method for manufacturing a light guide plate mold and a... Method for manufacturing a light guide plate mold and a...

2006-07-25

2006-07-25

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S320000, C264S001240, C264S002500

Reexamination Certificate

active

07081332

ABSTRACT:
A method for manufacturing a light guide plate (70) includes: providing a first substrate (30); coating a photo-resist (600) on the first substrate; exposing the photo-resist using a photo mask; developing the photo-resist; anisotropically dry etching the first substrate; removing remaining photo-resist (640), thereby providing a mold (40); providing a second substrate (50) and a hot-embossing machine (80), and conducting hot-embossing of the second substrate using the mold and the hot-embossing machine, thereby providing the light guide plate. By using the above-described dry etching and hot-embossing methods, a pattern of the photo mask is precisely transferred to the first substrate and the light guide plate. A diameter of the each of micro-dots formed on the light guide plate is as little as 10 nanometers. Thus a uniformity of luminance and color provided by the entire light guide plate is improved.

REFERENCES:
patent: 2003/0020189 (2003-01-01), Chen et al.
patent: 2003/0086030 (2003-05-01), Taniguchi et al.

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