Method for manufacturing a buried heterostructure laser diode

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156653, 156655, 156657, 1566591, 156662, 437129, 437133, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

049941437

ABSTRACT:
A method for manufacturing a buried heterostructure laser diode comprising an active layer and a clad layer which are formed as a reverse mesa on a substrate, current blocking layers and an insulation layer deposited on the top of the blocking layers, and an electrode formed on the top thereof comprising: a first step for forming a SiO.sub.2 stripe mask on the clad layer after a first liquid phase epitaxial growth of the active layer and the clad layer on the substrate, a second step for etching the clad layer under the SiO.sub.2 stripe mask using an etchant to form a reverse mesa structure, a third step for selectively etching the clad layer using an etchant such as a family of hydrochloric acid and then for making the active layer protrude, and a fourth step for naturally melthig back the protruded porting of the active layer surface during the second epitaxial growth process is provided.

REFERENCES:
patent: 4648940 (1987-03-01), Menigaux et al.
patent: 4662988 (1987-05-01), Renner
patent: 4692206 (1987-09-01), Kaneiwa et al.
patent: 4784722 (1988-11-01), Liau et al.

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