Method for manufacturing a bottom substrate of a liquid...

Details Method for manufacturing a bottom substrate of a liquid... Method for manufacturing a bottom substrate of a liquid...

2006-12-15

2008-10-14

Baumeister, Bradley W (Department: 2891)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S030000, C438S151000, C438S697000

Reexamination Certificate

active

07435632

ABSTRACT:
A method for manufacturing a bottom substrate of a liquid crystal display device by using only three masks is disclosed. The method includes the following steps. First, a patterned first metal layer, an insulating layer, a semiconductor layer and a second metal layer are formed subsequently on a substrate. Afterwards, the second metal layer is manufactured to have two different thicknesses by using a photolithographic process. After that, a planar layer is formed on the second metal layer and then the planar layer is etched until part of the second metal layer is exposed. Finally, a patterned transparent electrode layer is formed on the second metal layer.

REFERENCES:
patent: 6784032 (2004-08-01), Lee et al.
patent: 2007/0002196 (2007-01-01), Chiu et al.
patent: 2007/0096100 (2007-05-01), Lee et al.
S.Wolf and T.N.Tauber, Silicon Processing for the VLSI Era, vol. 1, Lattice Press, 2000, pp. 488, 512, 537, 538.

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