Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1991-12-13
1993-03-30
McCamish, Marion E.
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
505728, 505734, 505736, 505742, 430311, 430318, 430323, 430327, 430330, 427 62, 427 63, 427226, 427377, B05D 302, B05D 512
Patent
active
051984121
ABSTRACT:
A process is disclosed for producing superconductor films on a variety of substrates, and more particularly a patterned superconductor film on a planar substrate. The basic process includes the steps of: 1) depositing a metal film of superconductor precursor elements on a substrate; 2) patterning the metal film; and 3) oxidizing the metal film to form a superconductor film. Because the process separates the metal precursor film formation, patterning, and oxidation steps, each of the steps can be individually optimized.
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Evetts, J. E. et al. "Structural Stability & Kinetic Processes in YBaCuO Thin Films and Device Structures" Proceedings of Symposium S; 1987 Spring Meeting of the Materials Research Society Apr. 1987, pp. 227-229.
Owen et al. "Application of IC Technology to Fabrication of Lg. Numbers of Niobium based Josephson Junctions" IEEE transactions on Magnetics; vol. MAG-11 No. 2 pp. 774-777 Mar. 1975.
Kirschman et al. "Advances in Superconducting Quantum Electronic Microcircuit Fabrication" IEEE Transactions on Magnetics; vol. MAG-11 No. 2 pp. 778-781 Mar. 1975.
Anderson John T.
Nagesh V. K.
Duda Kathleen
Hewlett--Packard Company
McCamish Marion E.
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