Method for making Si/SiC composite material

Details Method for making Si/SiC composite material Method for making Si/SiC composite material

1993-09-29

1995-05-23

Utech, Benjamin L.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

427344, 4273744, 4273835, 4273977, 427404, 427275, C03C 1500, B05D 342

Patent

active

054178037

ABSTRACT:
A silicon/silicon carbide material which eliminates contamination by outgassing and direct contact is described as well as wafer processing parts made of this material and wafer processing methods using the silicon/silicon carbide material. An ultraclean silicon/silicon carbide material may be formed by first forming a Si/SiC part by prior art methods. The Si/SiC part then is subjected to a temperature sufficient to cause the impurities within the silicon carbide to either react and/or diffuse into the silicon fill. The contaminated silicon fill is then removed, either by high temperature evaporation or by a chemical etch. Clean silicon is then impregnated within the pore space of the silicon carbide part. The part which results has ultraclean silicon and silicon carbide grains which have most, if not all, of the impurities removed from the surface of the grains. Thus, an ultraclean material results which will not outgas or directly contaminate silicon wafers.

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M. E. Washburn, "Reaction-Formed Ceramics" Ceramic Bulletin 67[2] 356-363 1988.

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