Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-05-30
1996-07-16
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430323, 430324, 430326, G03F 900
Patent
active
055366066
ABSTRACT:
A method for making self aligned rim phase shifting masks for photolithography is provided. The method includes providing a transparent substrate (e.g., quartz) having a patterned opaque layer (e.g., chrome) and then forming phase shifters at the rim or edges of the features defined by the opaque layer. The phase shifters are formed by depositing two different layers of transparent material (e.g., Si.sub.3 N.sub.4 /SiO.sub.2) over the substrate and opaque layer. The first layer of material is a spacer layer which accurately spaces the rim phase shifters from the feature. The second layer of material is a phase shifter layer that forms the bulk of the rim phase shifters. Following deposition both layers are planarized to expose the spacer layer. The spacer layer is then selectively etched with respect to the phase shifter layer. This is followed by another etch of the phase shifter layer to form the rim phase shifters.
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Gratton Stephen A.
Micro)n Technology, Inc.
Rosasco S.
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