Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1990-02-14
1992-07-28
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419211, 20419214, 20419216, C23C 1434
Patent
active
051338459
ABSTRACT:
A prosthetic device includes a turbostratic biocompatible carbon film firmly adherent to a substrate and having a density of at least 2.1 g/cm.sup.3. The carbon preferably is very thin, e.g., less than about one micron. The thin carbon biocompatible film covers at least that portion of the substrate which will be in contact with body tissue and/or fluids to insure against physiological rejection and degradation of the prosthetic device. The carbon can be deposited on a variety of substrates, including low temperature substrates, in situ, without adversely affecting the mechanical properties of the substrate. The prosthetic device of the invention is formed by triode sputtering vacuum deposition at a relatively low temperature to achieve the desired results with respect to the deposited carbon and the substrate and with respect to the required adherence therebetween.
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patent: 4142958 (1979-03-01), Wei et al.
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C. Neissmantel, "Ion Beam . . . Structures", J. Vac. Sci. Technol. 18(2), Mar. 1981, pp. 179-185.
B. Banks et al., "Ion Beam . . . Films", J. Vac. Sci. Technol. 21(3), Sep./Oct. 1982, pp. 807-814.
Aisenberg et al., "Ion Beam . . . Carbon", J. of Appl. Phys., vol. 42, No. 7, Jun. 1971, pp. 2953-2958.
Arru Pietro
Vallana Franco
Nguyen Nam
Sorin Biomedica S.p.A.
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