Method for making polyimide microlithographic compositions solub

Details Method for making polyimide microlithographic compositions solub Method for making polyimide microlithographic compositions solub

1989-03-31

1991-10-15

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430299, 430327, 430323, 430271, 430330, 430325, 430326, G03F 730, G03F 740

Patent

active

050573993

ABSTRACT:
Nonamic acidic functionalized diamines and dianhydrides are condensed to produce abnormal acid functionalized polyamic acid/imide resins which surprisingly afford effective lift-off, by alkaline media, even after higher imidization.

REFERENCES:
patent: 4451551 (1984-05-01), Kataoka et al.
patent: 4548891 (1985-10-01), Riediker et al.
patent: 4659650 (1987-03-01), Moritz et al.
patent: 4880722 (1989-11-01), Moreau et al.

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