Method for making non-alloyed heterojunction ohmic contacts

Metal treatment – Compositions – Heat treating

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29576B, 29590, 148175, 148187, 357 65, 357 91, H01L 21265, H01L 29261, H01L 2348, H01L 754

Patent

active

043989632

ABSTRACT:
Ultra low resistance heterojunction ohmic contacts to semiconductors such gallium arsenide (GaAs) is described wherein a single crystal layer of germanium degenerately doped with arsenic is deposited on gallium arsenide using molecular-beam epitaxy (MBE). A metallic film is then deposited over the single crystal layer of heavily doped germanium so as to obtain a non-alloyed heterojunction ohmic contact having a very low specific resistance.

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patent: 4335362 (1982-06-01), Salathe et al.
Jaros et al., Solid St. Electronics, 18, (1975), 1029.
Barnes et al., Appl. Phys. Letts., 33, (1978), 965.

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