Method for making multilayer resist structures with thermosettin

Details Method for making multilayer resist structures with thermosettin Method for making multilayer resist structures with thermosettin

1996-08-06

1999-07-06

Wilson, Donald R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430935, 430517, 430519, 430521, 522904, 523436, 525510, 525514, 525523, 525533, G03C 1795, G03C 1835, C08L 5900, C08L 504

Patent

active

059195983

ABSTRACT:
A method for making multilayer resist structures for microlithographic processing using a thermosetting anti-reflective coating is disclosed for a broad range of exposure wavelengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 3.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast crosslinking agent, all present in a low-to-medium alcohol-containing solvent.

REFERENCES:
patent: 3624013 (1971-11-01), Sekmakas et al.
patent: 3956043 (1976-05-01), Zahir et al.
patent: 4316940 (1982-02-01), Thornley
patent: 4544691 (1985-10-01), Dexter et al.
patent: 4657842 (1987-04-01), Finter et al.
patent: 5482817 (1996-01-01), Dichiara et al.
Lee et al., "Handbook of Epoxy Resins", McGraw-Hill Book Co., pp. 10/14-15 (1982 Reissue).

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