Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-05-19
1988-08-30
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041922, 20419231, 204298, 427131, 427132, C23C 1436
Patent
active
047675160
ABSTRACT:
A magnetic recording tape making process and apparatus is disclosed. The apparatus includes a first depositing station which utilizes a the sputtering process for depositing a seed layer on a substrate with an initial incident angle of about 5.degree., and a second depositing station for depositing, over the seed layer, an extended layer with an initial incident angle of about 45.degree.. The seed layer has a thickness of about 0.01 micrometer, and is defined by young crystalline columns of magnetic material densely and perpendicularly formed on the substrate. The extended layer is defined by extended crystalline columns over the young crystalline columns through self-epitaxial growth. The completed magnetic film defined by the two layers has a high residual magnetization ratio MV/MH and also a high perpendicular coercivity Hcv.
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Kishimoto Daisuke
Kume Minoru
Nakatsuka Yoshio
Leader William T.
Niebling John F.
Sanyo Electric Co,. Ltd.
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