Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1995-05-30
1997-03-04
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430 9, 430313, 430315, 430318, 204478, 204485, G03C 500
Patent
active
056078188
ABSTRACT:
A method for electrophoretically depositing a layer of photoresist on a non-planar silicon structure and a method for forming a non-planar silicon structure using electrophoretic deposition are provided. The method comprises forming a silicon substrate with a non-planar topography and forming a conductive layer on the substrate. The substrate is then submerged in an electrolytic bath containing a photoresist solution comprising a polymer and a charged carrier group. At the same time the conductive layer is connected to a voltage source and to a non-sacrificial electrode and electrically biased. The biased conductive layer attracts the carrier group and causes a layer of photoresist to uniformly deposit on the conductive layer. The layer of photoresist can then be exposed and developed to form a photomask for etching the conductive layer. In an illustrative embodiment the silicon structure is an interconnect for testing unpackaged semiconductor dice. In another embodiment the silicon structure is a semiconductor structure having a dielectric layer formed on a non-planar topography and metal conductive lines formed on the dielectric layer.
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Akram Salman
Farnworth Warren
Hembree David R.
Gratton Stephen A.
Micro)n Technology, Inc.
Rosasco S.
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