Method for making folded extended window field effect transistor

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156656, 156657, 1566591, 156662, 437 43, 437 56, H01L 21306, B44C 122, C03C 1500, C23F 102

Patent

active

048447765

ABSTRACT:
A gate electrode having an insulating top layer as well as insulating sidewall spacers permits the source and drain regions to be electrically contacted through windows directly above the source and drain regions formed in a window pad layer. The window pad layer may also be used as a sublevel interconnect.

REFERENCES:
patent: 4324038 (1982-04-01), Chang
patent: 4453306 (1984-06-01), Lynch
Japanese Journal of Applied Physics, 21, pp. 34-38, Symposium on VLSI Technology, Sep. 1-3, 1982.
IBM Technical Disclosure Bulletin, 26, pp. 4303-4307, Jan., 1984.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for making folded extended window field effect transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for making folded extended window field effect transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for making folded extended window field effect transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-850548

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.