Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1987-12-04
1989-07-04
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156656, 156657, 1566591, 156662, 437 43, 437 56, H01L 21306, B44C 122, C03C 1500, C23F 102
Patent
active
048447765
ABSTRACT:
A gate electrode having an insulating top layer as well as insulating sidewall spacers permits the source and drain regions to be electrically contacted through windows directly above the source and drain regions formed in a window pad layer. The window pad layer may also be used as a sublevel interconnect.
REFERENCES:
patent: 4324038 (1982-04-01), Chang
patent: 4453306 (1984-06-01), Lynch
Japanese Journal of Applied Physics, 21, pp. 34-38, Symposium on VLSI Technology, Sep. 1-3, 1982.
IBM Technical Disclosure Bulletin, 26, pp. 4303-4307, Jan., 1984.
Lee Kuo-Hua
Lu Chih-Yuan
Yaney David S.
American Telephone and Telegraph Company AT&T Bell Laboratories
Powell William A.
Rehberg John T.
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