Method for making electrical contact with an active area through

Details Method for making electrical contact with an active area through Method for making electrical contact with an active area through

1992-06-23

1993-07-20

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437 41, 437 44, 437183, 437203, H01L 2144, H01L 2148

Patent

active

052293262

ABSTRACT:
A semiconducting processing method for making electrical contacts with an active area in sub-micron geometries includes: (a) providing a pair of conductive runners on a semiconductor wafer; (b) providing insulative spacers on the sides of the conductive runners wherein adjacent spacers are spaced a selected distance apart at a selected location on the wafer; (c) providing an active area between the conductive runners at the selected location; (d) providing an oxide layer over the active area and conductive runners; (e) providing a planarized nitride layer atop the oxide layer; (f) patterning and etching the nitride layer selectively relative to the oxide layer to define a first contact opening therethrough, wherein the first contact opening has an aperture width at the nitride layer upper surface which is greater than the selected distance between the insulative spacers; (g) etching the oxide layer within the first contact opening to expose the active area; (h) providing a polysilicon plug within the first contact opening over the exposed active areas; (i) providing an insulating layer over the nitride layer and the polysilicon plug; (j) patterning and etching the insulating layer to form a second contact opening to and exposing the polysilicon plug; and (k) providing a conductive layer over the insulating layer and into the second opening to electrically contact the polysilicon plug. A semiconductor device having buried landing plugs of approximately uniform height across the wafer is also described.

REFERENCES:
patent: 4617193 (1986-10-01), Wu
patent: 4868138 (1989-09-01), Chan et al.
patent: 4892845 (1990-01-01), Bridges
patent: 5110766 (1992-05-01), Maeda et al.
patent: 5158910 (1992-10-01), Cooper et al.
patent: 5171713 (1992-12-01), Matthews

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