Method for making a semiconductor structure using silicon...

Details Method for making a semiconductor structure using silicon... Method for making a semiconductor structure using silicon...

2007-01-16

2007-01-16

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Germanium or silicon or ge-si on iii-v

C438S752000, C438S753000, C257SE21008, C257S411000, C257S582000, C257S648000

Reexamination Certificate

active

10836172

ABSTRACT:
A semiconductor substrate having a silicon layer is provided. In one embodiment, the substrate is a silicon-on-insulator (SOI) substrate having an oxide layer underlying the silicon layer. An amorphous or polycrystalline silicon germanium layer is formed overlying the silicon layer. Alternatively, germanium is implanted into a top portion of the silicon layer to form an amorphous silicon germanium layer. The silicon germanium layer is then oxidized to convert the silicon germanium layer into a silicon dioxide layer and to convert at least a portion of the silicon layer into germanium-rich silicon. The silicon dioxide layer is then removed prior to forming transistors using the germanium-rich silicon. In one embodiment, the germanium-rich silicon is selectively formed using a patterned masking layer over the silicon layer and under the silicon germanium layer. Alternatively, isolation regions may be used to define local regions of the substrate in which the germanium-rich silicon is formed.

REFERENCES:
patent: 6369438 (2002-04-01), Sugiyama
patent: 6759712 (2004-07-01), Bhattacharyya
patent: 6764883 (2004-07-01), Dokumaci et al.
patent: 6998683 (2006-02-01), Bhattacharyya
patent: 7042052 (2006-05-01), Bhattacharyya
patent: 2003/0006461 (2003-01-01), Tezuka
patent: 2000-243946 (2000-09-01), None

Affiliated with

Also associated with

Rating

Method for making a semiconductor structure using silicon... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for making a semiconductor structure using silicon..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for making a semiconductor structure using silicon... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3753854