Method for making a semiconductor device including...

Details Method for making a semiconductor device including... Method for making a semiconductor device including...

2006-12-26

2006-12-26

Estrada, Michelle (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S003000, C438S240000, C438S938000, C438S110000, C257S009000, C257SE29298

Reexamination Certificate

active

07153763

ABSTRACT:
A method for making a semiconductor device may include forming a superlattice including a plurality of stacked groups of layers, with each group of layers comprising a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. The method may also include performing at least one anneal prior to completing forming of the superlattice.

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