Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2005-09-06
2005-09-06
Thompson, Craig A. (Department: 2813)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
Reexamination Certificate
active
06939815
ABSTRACT:
A method for making a semiconductor device is described. That method comprises forming a metal oxide layer on a substrate, converting at least part of the metal oxide layer to a metal layer; and oxidizing the metal layer to generate a metal oxide high-k gate dielectric layer.
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Barnak John P.
Brask Justin K.
Chau Robert S.
Doczy Mark L.
Hareland Scott A.
Blakely Sokoloff Taylor and Zafman
Dolan Jennifer M
Thompson Craig A.
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