Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2006-01-10
2006-01-10
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S041000, C216S066000, C073S504010, C310S31300R
Reexamination Certificate
active
06984332
ABSTRACT:
A gyroscope comprises a piezoelectric substrate having a surface. Disposed on the surface are a resonator transducer, a pair of reflectors, a structure such as a metallic dot, and a sensor transducer. The resonator transducer creates a first surface acoustic wave on the surface. The pair of reflectors reflects the first surface acoustic wave to form a standing wave within a region of the surface between the pair of reflectors. The structure is disposed on the surface within the region, wherein a Coriolis force acting upon the structure creates a second surface acoustic wave. The sensor senses the second surface acoustic wave and provides an output indicative thereof.
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Kollakompil Jose A
Suh William D.
Varadan Vasundara V
Varadan Vijay K.
Xavier Pascal B
Ahmed Shamim
Ohlandt, Greeley, Ruggiero&Perle L.L.P.
The Penn State Research Foundation
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