Method for making a lithographic base and a lithographic printin

Details Method for making a lithographic base and a lithographic printin Method for making a lithographic base and a lithographic printin

1998-07-02

2000-04-04

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430531, 430532, 430533, 427535, 427536, G03C 176

Patent

active

060459697

ABSTRACT:
The present invention provides a method for obtaining a lithographic base comprising on a hydrophobic support a hydrophilic layer contiguous to said support containing a non-gelatinous hydrophilic (co)polymer or (co)polymer mixture, characterized in that said hydrophobic support is treated with a plasma treatment with an applied power density during the plasma treatment of at least 70 W min/m.sup.2 before applying to said support said hydrophilic layer.

REFERENCES:
patent: 3971660 (1976-07-01), Staehle
patent: 4036136 (1977-07-01), Takagi
patent: 4451497 (1984-05-01), Dolezalek et al.
patent: 4476153 (1984-10-01), Staehle
patent: 5196288 (1993-03-01), Nakamura
Patent Abstracts of Japan, vol. 017, No. 251 (C-1060), May 19, 1993, and JP 05 001160 A (Du Pont Toray Co. Ltd.), Jan. 8, 1993 and Derwent Publications Ltd., London, GB; AN 93-049682.

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