Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2008-12-01
2011-10-11
Chen, Bret (Department: 1715)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S571000, C427S577000, C427S096600, C427S108000, C204S192100
Reexamination Certificate
active
08034419
ABSTRACT:
Disclosed is a method relating to graded-composition barrier coatings comprising first and second materials in first and second zones. The compositions of one or both zones vary substantially continuously across a thickness of the zone in order to achieve improved properties such as barrier, flexibility, adhesion, optics, thickness, and tact time. The graded-composition barrier coatings find utility in preventing exposure of devices such as organic electro-luminescent devices (OLEDs) to reactive species found in the environment.
REFERENCES:
patent: 3932693 (1976-01-01), Shaw et al.
patent: 4540763 (1985-09-01), Kirchhoff
patent: 4552791 (1985-11-01), Hahn
patent: 4861671 (1989-08-01), Muchnik et al.
patent: 5051308 (1991-09-01), Reed et al.
patent: 5185391 (1993-02-01), Stokich
patent: 5462779 (1995-10-01), Misiano et al.
patent: 5654084 (1997-08-01), Egert
patent: 5683757 (1997-11-01), Iskanderova et al.
patent: 5714838 (1998-02-01), Haight et al.
patent: 5736207 (1998-04-01), Walther et al.
patent: 5757126 (1998-05-01), Harvey et al.
patent: 5922481 (1999-07-01), Etzbach et al.
patent: 5923970 (1999-07-01), Kirlin
patent: 5998803 (1999-12-01), Forrest et al.
patent: 6023371 (2000-02-01), Onitsuka et al.
patent: 6097147 (2000-08-01), Baldo et al.
patent: 6198217 (2001-03-01), Suzuki et al.
patent: 6268695 (2001-07-01), Affinito
patent: 6291116 (2001-09-01), Wolk et al.
patent: 6395341 (2002-05-01), Arakawa et al.
patent: 6413645 (2002-07-01), Graff et al.
patent: 6521916 (2003-02-01), Roberts et al.
patent: 6522067 (2003-02-01), Graff et al.
patent: 6558219 (2003-05-01), Burroughes et al.
patent: 6576351 (2003-06-01), Silvernail
patent: 6624568 (2003-09-01), Silvernail
patent: 6642092 (2003-11-01), Voutsas et al.
patent: 6642652 (2003-11-01), Collins, III et al.
patent: 6703780 (2004-03-01), Shiang
patent: 6777871 (2004-08-01), Duggal et al.
patent: 6815887 (2004-11-01), Lee et al.
patent: 6872114 (2005-03-01), Chung et al.
patent: 6892011 (2005-05-01), Walker et al.
patent: 6923702 (2005-08-01), Graff et al.
patent: 6949389 (2005-09-01), Pichler et al.
patent: 7015640 (2006-03-01), Schaepkens et al.
patent: 7077935 (2006-07-01), Ziegler et al.
patent: 7154220 (2006-12-01), Schaepkens et al.
patent: 7166366 (2007-01-01), Moser
patent: 7199518 (2007-04-01), Couillard
patent: 7223515 (2007-05-01), Wolk et al.
patent: 7413982 (2008-08-01), Levy
patent: 7740960 (2010-06-01), Zhu et al.
patent: 2002/0142583 (2002-10-01), Chopra
patent: 2003/0020085 (2003-01-01), Bour et al.
patent: 2003/0194497 (2003-10-01), Takada et al.
patent: 2004/0046497 (2004-03-01), Schaepkens et al.
patent: 2004/0058157 (2004-03-01), Ishikawa
patent: 2004/0219380 (2004-11-01), Naruse et al.
patent: 2005/0051763 (2005-03-01), Affinito et al.
patent: 2005/0082971 (2005-04-01), Couillard
patent: 2005/0253509 (2005-11-01), Schaepkens et al.
patent: 2005/0260395 (2005-11-01), Schaepkens et al.
patent: 2006/0132032 (2006-06-01), Schaepkens et al.
patent: 2006/0181669 (2006-08-01), Schaepkens et al.
patent: 2006/0208634 (2006-09-01), Schaepkens et al.
patent: 2006/0216410 (2006-09-01), Schaepkens et al.
patent: 2007/0036887 (2007-02-01), Haase et al.
patent: 2007/0077850 (2007-04-01), Couillard
patent: 2007/0238311 (2007-10-01), Levy
patent: 2008/0132050 (2008-06-01), Lavoie
patent: 2009/0127462 (2009-05-01), Gunapala et al.
patent: 0026973 (2000-05-01), None
patent: 0181649 (2001-11-01), None
patent: 0182336 (2001-11-01), None
patent: 1062844 (2003-10-01), None
patent: 2348316 (2000-09-01), None
patent: 2003231765 (2003-08-01), None
patent: 2004098525 (2004-04-01), None
patent: 9839497 (1998-09-01), None
patent: 2004025749 (2004-03-01), None
patent: 2004073046 (2004-08-01), None
patent: 2005025853 (2005-03-01), None
patent: 2005043585 (2005-05-01), None
patent: 2005051525 (2005-06-01), None
patent: 2005122293 (2005-12-01), None
patent: 2006016153 (2006-02-01), None
patent: 2006071938 (2006-07-01), None
patent: 2007021544 (2007-02-01), None
patent: 2007109482 (2007-09-01), None
Jamarani, F., et al., “Compositionally graded thermal barrier coatings for high temperature aero gas turbine components”. Surface and Coatings Technology, 54/55 (1992) pp. 58-63.
Hubner, R., et al., “Structure and thermal stability of graded Ta-TaN diffusion barriers between Cu and SiO2”. Thin Solid Films 437 (2003), pp. 248-256.
Otsuka, Y., et al., “Graded composition and valence states in self-forming barrier layers at Cu-Mn/SiO2 interface”. Applied Physics Letters 96, 012101 (2010), pp. 1-3.
Gao, J., et al., “Preparation of Continually Graded Barriers of YPrBaCuO for HTS Josephson Junctions”. IEEE Transactions on Applied Superconductivity, vol. 11, No. 1, Mar. 2001, pp. 497-500.
H. Suzuki et al., Near-Ultraviolet Electroluminescence from Polysilanes 331 Thin Solid Films 64-70 (1998).
Gijsbert Jan Meeusen, “Plasma Beam Deposition of Amorphous Hydrogenated Silicon,” Thesis, University of Eindhoven, pp. 16-19 (1994).
Bastiaan Arie Korevaar, “Integration of Expanding Thermal Plasma Deposited Hydrogenated Amorphous Silicon in Solar Cells,” Thesis, University of Eindhoven, pp. 23-34 (2002).
V.J. Law et al., “RF Probe Technology for the Next Generation of Technological Plasmas,” J. Phys. D: Appl. Phys., 34, 2726-2733 (2001).
International Searching Authority, International Search Report for related PCT Application to U.S. Appl. No. 10/879,468.dated Aug. 28, 2007.
Akihiro Hashimoto, et al., “Properties of PECVD SiOxNy Films as Selective Diffusion Barrier,” Jul. 1985, J. Electrochem. Soc.: Solid-State Science & Technology, vol. 133, No. 7, pp. 1464-1467.
M.I. Alayo, et al., On the nitrogen and oxygen incorporati on in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films, 2002, Thin Solid Films, vol. 402, pp. 154-161.
Duggal Anil
Erlat Ahmet Gun
Scherer Brian Joseph
Tandon Sheila
Yan Min
Chen Bret
General Electric Company
Testa Jean K.
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