Method for liquid phase epitaxy multiple dipping of wafers for b

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156DIG98, 23301, C30B 1904

Patent

active

042434726

ABSTRACT:
A method for batch processing wafers by liquid phase epitaxy (LPE) dipping methods for uniformity of film thickness wafer-to-wafer and uniformity of film on each individual wafer for use in bubble (domain) memories comprising, supporting a plurality of wafers substantially horizontal on a substrate holder and lowering and immersing said wafers into the melt to be deposited as a thin film on each wafer and, while immersed, continually moving the wafers up and down as well as continually oscillating the wafers through substantially 360.degree..

REFERENCES:
patent: 2793941 (1957-05-01), Estes
patent: 3647578 (1972-03-01), Barnett et al.
patent: 3677718 (1972-07-01), Lawless
patent: 4077832 (1978-03-01), Robertson et al.
patent: 4092208 (1978-05-01), Brice et al.
patent: 4191365 (1980-03-01), O'Neill

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for liquid phase epitaxy multiple dipping of wafers for b does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for liquid phase epitaxy multiple dipping of wafers for b, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for liquid phase epitaxy multiple dipping of wafers for b will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-283523

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.