Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2004-12-27
2009-12-29
Do, Thuan (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000, C703S014000
Reexamination Certificate
active
07640530
ABSTRACT:
A mask inspection system10inspects an inspection object pattern while comparing an inspection object data obtained in such a way as to image the inspection object pattern with a reference pattern data. The mask inspection system10is provided with an inspection information preparing part12producing inspection algorithm and inspection sensitivity to the reference pattern data based on wafer simulation, a converting part13generating a reference graphic data with inspection information while adding the inspection information to the reference graphic data, and a defect judging part16judges propriety of an inspection object pattern data while comparing reference graphic data with an inspection object data in every pixel based on the inspection information added to the reference graphic data with inspection information.
REFERENCES:
patent: 6990225 (2006-01-01), Tanaka et al.
patent: 2776416 (1998-05-01), None
patent: 2003-215059 (2003-07-01), None
patent: WO 99/14706 (1999-03-01), None
Do Thuan
NEC Electronics Corporation
Young & Thompson
LandOfFree
Method for inspecting mask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for inspecting mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for inspecting mask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4108176