Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation
Reexamination Certificate
2006-03-07
2006-03-07
Bui, Bryan (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Quality evaluation
C702S035000, C702S083000
Reexamination Certificate
active
07010447
ABSTRACT:
Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.
REFERENCES:
patent: 5737072 (1998-04-01), Emery et al.
patent: 5844850 (1998-12-01), Tsutsui et al.
patent: 5907100 (1999-05-01), Cook
patent: 6009545 (1999-12-01), Tsutsui et al.
patent: 6388747 (2002-05-01), Nara et al.
patent: 6792359 (2004-09-01), Ninomiya et al.
patent: 55-149829 (1980-11-01), None
patent: 59-157505 (1984-09-01), None
patent: 59-192943 (1984-11-01), None
patent: 59-232344 (1984-12-01), None
patent: 02-071377 (1990-03-01), None
patent: 02-100393 (1990-04-01), None
patent: 03-156947 (1991-07-01), None
patent: 04-027850 (1992-01-01), None
patent: 04-216904 (1992-08-01), None
patent: 06-162987 (1994-06-01), None
patent: 07-140085 (1995-06-01), None
patent: 09-022676 (1997-01-01), None
patent: WO97/35337 (1997-09-01), None
patent: 10-340935 (1998-12-01), None
patent: 11-167893 (1999-06-01), None
patent: 2002-39959 (2002-02-01), None
Masao Iri:Calculation Geometry and Geometry Information Processing, Kyoritsu Publishing Ltd., pp. 110-121, 1986.
Isogai Seiji
Kurosaki Toshiei
Matsui Shigeru
Ninomiya Takanori
Bui Bryan
Hitachi , Ltd.
Kenyon & Kenyon
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