Method for inspecting a pattern and an apparatus for inspecting

Radiant energy – Photocells; circuits and apparatus – Photocell controlled circuit

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250563, G06K 964, G06F 15336

Patent

active

046738169

ABSTRACT:
A method and an apparatus for inspecting a high density pattern in which a signal obtained by scanning a mask substrate having a high density pattern including repeated pattern portions is collated and compared with the signal obtained from original data used to generate the pattern. Repeated pattern data corresponding to the signal obtained by scanning said mask substrate and the repeated basic pattern data corresponding to the basic pattern of the repeated pattern portion are repeatedly collated and compared when inspecting repeated pattern portions and the repeated pattern data and the original pattern data obtained by sequentially converting the original data in synchronization with the scanning are collated and compared when inspecting the high density pattern of an area other than the repeated pattern portions.

REFERENCES:
patent: 4435834 (1984-03-01), Pauli et al.

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