Method for in-situ liquid flow rate estimation and verification

Details Method for in-situ liquid flow rate estimation and verification Method for in-situ liquid flow rate estimation and verification

1996-04-03

1997-07-08

Bueker, Richard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to condition of coating material

118708, 118710, 118712, 118715, 118726, C23C 1600

Patent

active

056456425

ABSTRACT:
The flow of a liquid reagent gas into a vapor deposition process chamber is adjusted in response to control information provided by a process controller. The controller executes a prescribed mathematical algorithm which utilizes first and second steady-state pressure differentials. The first pressure differential is measured during the flowing of a carrier gas into the chamber. The second pressure differential is measured after the release of the liquid reagent into the chamber.

REFERENCES:
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patent: 4517220 (1985-05-01), Rose
patent: 4542650 (1985-09-01), Renken et al.
patent: 4671097 (1987-06-01), Kurki et al.
patent: 4989160 (1991-01-01), Garret et al.
patent: 5114752 (1992-05-01), Hall
patent: 5220515 (1993-06-01), Freerks et al.
patent: 5250135 (1993-10-01), Moss et al.

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