Method for improving the planarity of etched mirror facets

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156649, 156651, 1566591, 156662, 350 9612, H01L 21306, B44C 122

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050322192

ABSTRACT:
A method, and device produced therewith, for improving the planarity of etched mirror facets 18 of integrated optic structures with non-planar stripe waveguides, such as ridge or groove diode lasers or passive devices such as modulators and switches. The curvature of the mirror facet surface at the edges of the waveguide due to topographical, lithographical and etch process effects, causes detrimental phase distortions, and is avoided by widening the waveguide end near the mirror surface thereby shifting the curved facet regions away from the light mode region to surface regions where curvature is not critical.

REFERENCES:
IEEE Journal of Quantum Electronics, vol. QE-23, No. 8, Aug. 1987, pp. 1283-1286; J. Chen. S. Lee, "AlGaAs/GaAs Visible Ridge Waveguide Laser with Multicavity Structure".
IEEE Journal of Quantum Electronics, vol. QE-23, No. 3, Mar. 1987, pp. 309-312; L. D. Zhu et al., "Low Threshold Ridge Waveguide Single Quantum Well Laser Processed by Chemically Assisted Ion Beam Etching".

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