Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1993-11-03
1994-08-23
Kight, III, John
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430313, 430319, 430311, G03C 500
Patent
active
053407008
ABSTRACT:
A method of printing a sub-resolution device feature having first and second edges spaced in close proximity to one another on a semiconductor substrate includes the steps of first depositing a radiation-sensitive material on the substrate, then providing a first mask image segment which corresponds to the first edge. The first mask image segment is then exposed with radiation using an imaging tool to produce a first pattern edge gradient. The first pattern edge gradient defines the first edge of the feature in the material.
A second mask image segment is then provided corresponding to the second feature edge. This second mask image segment is exposed to radiation to produce a second pattern edge gradient which defines the second edge of the feature. Once the radiation-sensitive material has been developed, the two-dimensional feature is reproduced on the substrate.
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Chen Jang F.
Matthews James A.
Kight III John
MicroUnity Systems Engineering, Inc.
Mosley Terressa
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