Method for implementing overlay-based modification of VLSI...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

07490308

ABSTRACT:
A method of modifying a VLSI layout for performance optimization includes defining a revised set of ground rules for a plurality of original device shapes to be modified and flattening the plurality of original device shapes to a prime cell. A layout optimization operation is performed on the flattened device shapes, based on the revised set of ground rules, so as to create a plurality of revised device shapes. An overlay cell is then created from a difference between the revised device shapes and the original device shapes.

REFERENCES:
patent: 6189132 (2001-02-01), Heng et al.
patent: 6807663 (2004-10-01), Cote et al.
patent: 6901574 (2005-05-01), LaCour et al.
patent: 6941528 (2005-09-01), Allen et al.
patent: 7089512 (2006-08-01), Iadanza et al.
patent: 2002/0157068 (2002-10-01), LaCour et al.
patent: 2002/0194575 (2002-12-01), Allen et al.
patent: 2003/0018948 (2003-01-01), Chang et al.
patent: 2006/0143589 (2006-06-01), Horng et al.
patent: 2006/0266243 (2006-11-01), Percin et al.
patent: 2007/0083846 (2007-04-01), Chuang et al.
patent: 2007/0101306 (2007-05-01), Bowers et al.

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