Method for imaging wafers using a projection mask aligner

Details Method for imaging wafers using a projection mask aligner Method for imaging wafers using a projection mask aligner

2006-12-19

2006-12-19

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Methods

C355S075000, C430S005000, C430S311000

Reexamination Certificate

active

07151593

ABSTRACT:
A method uses a projection mask aligner that includes a hard pellicle mounting apparatus having an enclosure with an interior cavity, an inlet port for receiving a mask with a protective cover, and an outlet port for outputting a mask covered by a hard pellicle, that has a demounting portion for removing the protective cover from the mask, that has a mounting portion for mounting the hard pellicle on the mask, and that has a conduit for receiving a light-transmitting gas. The method includes: forming a hard pellicle/mask assembly having at least one hard pellicle mounted thereon; positioning the hard pellicle/mask assembly between a light source and an imaging lens; positioning a photoresist-coated semiconductor wafer under the imaging lens with a photoresist layer facing the lens; and imaging microelectronics circuits from the hard pellicle/mask assembly onto the semiconductor wafer.

REFERENCES:
patent: 4378953 (1983-04-01), Winn
patent: 6264773 (2001-07-01), Cerio
patent: 6279249 (2001-08-01), Dao et al.
patent: 6300019 (2001-10-01), Ikeda et al.
patent: 6715495 (2004-04-01), Dao et al.
patent: 6731378 (2004-05-01), Hibbs
patent: 2002/0154285 (2002-10-01), Ramamoorthy et al.
patent: 2003/0227605 (2003-12-01), del Puerto et al.

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