Method for igniting a plasma in a plasma processing chamber

Details Method for igniting a plasma in a plasma processing chamber Method for igniting a plasma in a plasma processing chamber

1998-04-10

2000-03-07

Gorgos, Kathryn

Coating apparatus

Gas or vapor deposition

Work support

156345, 361234, 279128, C23C 1600

Patent

active

060334827

ABSTRACT:
A method and apparatus to prevent charging of a substrate, retained by an electrostatic chuck in a plasma chamber, during ignition of a plasma. The method deactivates a voltage to the chuck electrodes (or other conductive element in a substrate support pedestal) and allows the chuck electrodes to float during ignition of the plasma. The method activates the chuck electrodes again following the ignition of the plasma.

REFERENCES:
patent: 5460684 (1995-10-01), Saeki et al.
patent: 5463525 (1995-10-01), Barnes et al.
patent: 5665166 (1997-09-01), Deguchi et al.
patent: 5665167 (1997-09-01), Deguchi et al.
patent: 5815366 (1998-09-01), Morita et al.
patent: 5880924 (1999-03-01), Kumar et al.

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