Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Patent
1997-04-11
2000-11-28
Beck, Shrive
Coating processes
Coating by vapor, gas, or smoke
Mixture of vapors or gases utilized
4272481, 118719, 118728, C23C 1600
Patent
active
061532606
ABSTRACT:
The present invention is a single wafer reactor having a vented lower liner for heating exhaust gas. The apparatus of the present invention includes a reaction chamber. A wafer support member which divides the chamber into an upper and lower portion is positioned within the chamber. A gas outlet for exhausting gas from the chamber has a vent to exhaust gas from the lower portion of the chamber and an exhaust passage opening to exhaust gas from the upper portion of the chamber. Heated inert purge gas is fed from the lower chamber portion through the vent at a rate so as to prevent the deposition gas from condensing in the exhaust passage.
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Carlson David K.
Comita Paul B.
Fan Doria W.
Ranganathan Rekha
Riley Norma B.
Applied Materials Inc.
Beck Shrive
Chen Bret
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