Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – With tangential fluent material supply
Reexamination Certificate
2007-03-20
2007-03-20
Tran, Thuy Vinh (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
With tangential fluent material supply
C315S111410, C315S111510
Reexamination Certificate
active
10368344
ABSTRACT:
A method for generating a plasma. A gas flows along a flow path having the displacement identical to the lines of magnetic force of the main magnetic field, and high frequency alternating current is applied to the gas, thereby generating a gas plasma. For example, a gas is flowed through a pipe in a first direction. Electricity is conducted through the pipe in substantially the first direction. And a magnetic field is applied along a second direction (e.g., perpendicular to the first direction) to the gas flowing in the pipe such that a plasma is induced in the pipe.
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Korean Office Action dated Oct. 28, 2004, together with English translation.
Abstract only for JP 11288923 A published Oct. 19, 1999.
Abstract only for JP 58192390 A published Nov. 9, 1983.
Bae Do-In
Choi Dae-Kyu
Hwang Wan-Goo
Kim Jin-Man
Min Young-Min
Harness & Dickey & Pierce P.L.C.
Samsung Electronics Co,. Ltd.
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