Patent
1998-03-18
2000-04-04
Teska, Kevin J.
39550021, 39550022, G06F 1750
Patent
active
060471166
ABSTRACT:
In a method of generating from design data the exposure data necessary for a multistage-deflection charged beam exposure device that has a main deflector and a sub-deflector and forms a pattern, before a shape larger than the size of a minimum subfield area is divided during the generation of subfield exposure data, the process of dividing the shape into shapes equal to or smaller than the size of a subfield area and restructuring the shape is performed. Moreover, after the overlapping cell arrays in the design data are changed into a cell array structure preventing the cell arrays from overlapping, the resulting cell arrays are subjected to a hierarchical shape data operation process and a formatting process, including compression, subfield division, and frame division. This makes it possible to reduce the amount of data supplied without increasing the time required to converting the design data into exposure data supplied to the charged beam exposure device.
REFERENCES:
patent: 5526279 (1996-06-01), Dick
Shunko Magoshi, et al., "High-Speed Electron Beam Data Conversion System Combining Hierarchical Operation with Parallel Processsing", Japanese Journal of Applied Physics, vol. 31, No. 12B, Part 1, Dec. 1992, pp. 4257-4261.
Kiyomi Koyama, et al., "Shape Data Operations for VSB EB Data Conversion Using CAD Tools", Japanese Journal of Applied Physics, vol. 28, No. 11, Nov. 1989, pp. 2329-2332.
Tsuneo Okubo, et al., "New Algorithm for Overlapping Cell Treatment in Hierarchical CAD Data/Electron Beam Exposure Data Conversion", Proc. of 27.sup.th ACM/IEEE Design Automation Conference, (1990), pp. 321-326.
Abe Takayuki
Hara Shigehiro
Higurashi Hitoshi
Koyama Kiyomi
Murakami Eiji
Jones Hugh
Kabushiki Kaisha Toshiba
Teska Kevin J.
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