Method for forming wiring on a substrate

Etching a substrate: processes – Forming or treating electrical conductor article – Adhesive or autogenous bonding of self-sustaining preforms

Reexamination Certificate

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C216S036000, C216S041000

Reexamination Certificate

active

07413670

ABSTRACT:
A method for forming a wiring on a substrate includes the steps of preparing a copper substrate, plating a copper-nickel layer on a portion of the copper substrate, combining the copper substrate with a soft polyimide substrate, and etching the copper substrate.

REFERENCES:
patent: 4562119 (1985-12-01), Darms et al.
patent: 4806725 (1989-02-01), Narizuka et al.
patent: 4990934 (1991-02-01), Takeuchi et al.
patent: 5417164 (1995-05-01), Nishida et al.
patent: 5426850 (1995-06-01), Fukutomi et al.
patent: 5445608 (1995-08-01), Chen et al.
patent: 5589007 (1996-12-01), Fujioka et al.
patent: 5690747 (1997-11-01), Doscher
patent: 6440835 (2002-08-01), Lin
patent: 6794965 (2004-09-01), Shen et al.
patent: 2004/0001957 (2004-01-01), Seita et al.
patent: 2004/0159224 (2004-08-01), Raisanen
patent: 2004/0202958 (2004-10-01), Kataoka et al.
patent: 2005/0007218 (2005-01-01), Shen et al.
patent: 2003234564 (2003-08-01), None
patent: 556453 (2003-10-01), None

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