Method for forming ultra low k films using electron beam

Details Method for forming ultra low k films using electron beam Method for forming ultra low k films using electron beam

2005-03-09

2008-09-09

Padgett, Marianne L (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S552000, C427S255393, C427S489000, C427S579000, C438S788000, C438S789000

Reexamination Certificate

active

07422774

ABSTRACT:
The present invention generally provides a method for depositing a low dielectric constant film using an e-beam treatment. In one aspect, the method includes delivering a gas mixture comprising one or more organosilicon compounds and one or more hydrocarbon compounds having at least one cyclic group to a substrate surface at deposition conditions sufficient to deposit a non-cured film comprising the at least one cyclic group on the substrate surface. The method further includes substantially removing the at least one cyclic group from the non-cured film using an electron beam at curing conditions sufficient to provide a dielectric constant less than 2.5 and a hardness greater than 0.5 GPa.

REFERENCES:
patent: 4845054 (1989-07-01), Mitchener
patent: 4966613 (1990-10-01), Beaver
patent: 5000113 (1991-03-01), Wang et al.
patent: 5003178 (1991-03-01), Livesay
patent: 5028566 (1991-07-01), Lagendijk
patent: 5466942 (1995-11-01), Sakai et al.
patent: 5539211 (1996-07-01), Ohtoshi et al.
patent: 5554570 (1996-09-01), Maeda et al.
patent: 5776990 (1998-07-01), Hedrick et al.
patent: 5981960 (1999-11-01), Ooaeh et al.
patent: 5985032 (1999-11-01), Eriguchi et al.
patent: 5989998 (1999-11-01), Sugahara et al.
patent: 6051321 (2000-04-01), Lee et al.
patent: 6054379 (2000-04-01), Yau et al.
patent: 6057251 (2000-05-01), Goo et al.
patent: 6068884 (2000-05-01), Rose et al.
patent: 6080526 (2000-06-01), Yang et al.
patent: 6159871 (2000-12-01), Loboda et al.
patent: 6270900 (2001-08-01), Wakizaka et al.
patent: 6271146 (2001-08-01), Ross
patent: 6303047 (2001-10-01), Aronitz et al.
patent: 6312793 (2001-11-01), Grill et al.
patent: 6316063 (2001-11-01), Andideh et al.
patent: 6340628 (2002-01-01), Van Cleemput et al.
patent: 6352945 (2002-03-01), Matsuki et al.
patent: 6383955 (2002-05-01), Matsuki et al.
patent: 6394109 (2002-05-01), Somekh
patent: 6407399 (2002-06-01), Livesay
patent: 6410463 (2002-06-01), Matsuki
patent: 6420441 (2002-07-01), Allen et al.
patent: 6432846 (2002-08-01), Matsuki
patent: 6437443 (2002-08-01), Grill et al.
patent: 6441491 (2002-08-01), Grill et al.
patent: 6444136 (2002-09-01), Liu et al.
patent: 6455445 (2002-09-01), Matsuki
patent: 6458720 (2002-10-01), Aoi
patent: 6479110 (2002-11-01), Grill et al.
patent: 6486082 (2002-11-01), Cho et al.
patent: 6500773 (2002-12-01), Gaillard et al.
patent: 6509259 (2003-01-01), Wang et al.
patent: 6514880 (2003-02-01), Matsuki et al.
patent: 6524974 (2003-02-01), Sukharev
patent: 6541367 (2003-04-01), Mandal
patent: 6548899 (2003-04-01), Ross
patent: 6582777 (2003-06-01), Ross et al.
patent: 6583048 (2003-06-01), Vincent et al.
patent: 6583071 (2003-06-01), Weidman et al.
patent: 6593655 (2003-07-01), Loboda et al.
patent: 6596627 (2003-07-01), Mandal
patent: 6605549 (2003-08-01), Leu et al.
patent: 6652922 (2003-11-01), Forester et al.
patent: 6654558 (2003-11-01), Chen et al.
patent: 6677253 (2004-01-01), Andideh et al.
patent: 6716770 (2004-04-01), O'Neill et al.
patent: 6734533 (2004-05-01), Wong
patent: 6737365 (2004-05-01), Kloster et al.
patent: 6737866 (2004-05-01), Belt et al.
patent: 6756085 (2004-06-01), Waldfried et al.
patent: 6797643 (2004-09-01), Rocha-Alvarez et al.
patent: 6825130 (2004-11-01), Todd
patent: 6846515 (2005-01-01), Vrtis et al.
patent: 6852650 (2005-02-01), Matsuki et al.
patent: 6852777 (2005-02-01), Nakano et al.
patent: 6893985 (2005-05-01), Goodner
patent: 6897163 (2005-05-01), Gaillard et al.
patent: 6936551 (2005-08-01), Moghadam et al.
patent: 7018941 (2006-03-01), Cui et al.
patent: 7049247 (2006-05-01), Gates et al.
patent: 7056560 (2006-06-01), Yim et al.
patent: 7060330 (2006-06-01), Zheng et al.
patent: 7098149 (2006-08-01), Lukas et al.
patent: 7153783 (2006-12-01), Lu et al.
patent: 7166531 (2007-01-01), van den Hoek et al.
patent: 7256139 (2007-08-01), Moghadam et al.
patent: 7323399 (2008-01-01), Demos et al.
patent: 2002/0037442 (2002-03-01), Grill et al.
patent: 2002/0053353 (2002-05-01), Kawata et al.
patent: 2002/0063114 (2002-05-01), Dopper
patent: 2002/0098714 (2002-07-01), Grill et al.
patent: 2002/0142579 (2002-10-01), Vincent et al.
patent: 2002/0142585 (2002-10-01), Mandal
patent: 2002/0160626 (2002-10-01), Matsuki et al.
patent: 2002/0180051 (2002-12-01), Grill et al.
patent: 2002/0197849 (2002-12-01), Mandal
patent: 2003/0008998 (2003-01-01), Aoi
patent: 2003/0017718 (2003-01-01), Aoi
patent: 2003/0040195 (2003-02-01), Chang et al.
patent: 2003/0047691 (2003-03-01), Musil et al.
patent: 2003/0049460 (2003-03-01), O'Neil et al.
patent: 2003/0054115 (2003-03-01), Albano et al.
patent: 2003/0064607 (2003-04-01), Leu et al.
patent: 2003/0104689 (2003-06-01), Shioya et al.
patent: 2003/0104708 (2003-06-01), Cho et al.
patent: 2003/0109136 (2003-06-01), Shioya et al.
patent: 2003/0111712 (2003-06-01), Andideh
patent: 2003/0116421 (2003-06-01), Xu et al.
patent: 2003/0176030 (2003-09-01), Tsuji et al.
patent: 2003/0198742 (2003-10-01), Vrtis et al.
patent: 2003/0211244 (2003-11-01), Li et al.
patent: 2003/0211728 (2003-11-01), Mandal
patent: 2003/0224593 (2003-12-01), Wong
patent: 2003/0232137 (2003-12-01), Vrtis et al.
patent: 2004/0018303 (2004-01-01), Bruce et al.
patent: 2004/0038514 (2004-02-01), Hyodo et al.
patent: 2004/0039219 (2004-02-01), Chen et al.
patent: 2004/0058090 (2004-03-01), Waldfried et al.
patent: 2004/0076764 (2004-04-01), Forester et al.
patent: 2004/0096593 (2004-05-01), Lukas et al.
patent: 2004/0096672 (2004-05-01), Lukas et al.
patent: 2004/0099283 (2004-05-01), Waldfried et al.
patent: 2004/0175501 (2004-09-01), Lukas et al.
patent: 2004/0175957 (2004-09-01), Lukas et al.
patent: 2005/0153073 (2005-07-01), Zheng et al.
patent: 2005/0161060 (2005-07-01), Johnson et al.
patent: 2005/0214457 (2005-09-01), Schmitt et al.
patent: 2005/0227502 (2005-10-01), Schmitt et al.
patent: 2005/0230834 (2005-10-01), Schmitt et al.
patent: 2005/0233591 (2005-10-01), Schmitt et al.
patent: 2006/0027249 (2006-02-01), Johnson et al.
patent: 2006/0078676 (2006-04-01), Lukas et al.
patent: 2006/0216952 (2006-09-01), Bhanap et al.
patent: 2007/0059922 (2007-03-01), Clevenger et al.
patent: 2007/0134435 (2007-06-01), Ahn et al.
patent: 2007/0173071 (2007-07-01), Afzali-Ardakani et al.
patent: 0 935 283 (1999-11-01), None
patent: 1 354 980 (2003-10-01), None
patent: WO 97/00535 (1997-01-01), None
patent: WO 99/21706 (1999-05-01), None
patent: WO 01/29052 (2001-04-01), None
patent: WO 01/61737 (2001-08-01), None
patent: WO 02/11204 (2002-02-01), None
patent: WO 03/005429 (2003-01-01), None
patent: WO 03/095702 (2003-11-01), None
patent: WO 01/48805 (2004-07-01), None
PCT International Search Report for PCT/US03/14272, dated Jan. 21, 2004.
PCT International Search Report and Written Opinion for PCT/US2005/003425, dated May 6, 2005.
PCT Written Opinion for PCT/US03/14272, dated Feb. 15, 2005.

Affiliated with

Also associated with

Rating

Method for forming ultra low k films using electron beam does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming ultra low k films using electron beam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming ultra low k films using electron beam will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3986439