Method for forming through holes in a polyimide substrate

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156630, 156634, 156652, 156655, 156656, 1566591, 1566611, 156668, 156902, 156643, 156646, 21912169, 21912185, B44C 122, C23F 102, C03C 1500, B29C 3700

Patent

active

049591193

ABSTRACT:
Hole formation in a polyimide substrate employs a carbon dioxide laser.

REFERENCES:
patent: 4426253 (1984-01-01), Kreuz et al.
patent: 4472238 (1984-09-01), Johnson
patent: 4635358 (1987-01-01), Fritz
patent: 4642160 (1987-02-01), Burgess
patent: 4714516 (1987-12-01), Eichelberger et al.
patent: 4894115 (1990-01-01), Eichelberger et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming through holes in a polyimide substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming through holes in a polyimide substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming through holes in a polyimide substrate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-327484

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.