Method for forming thin film pattern, device and production...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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C438S641000, C438S675000

Reexamination Certificate

active

07138304

ABSTRACT:
A method for forming a thin film pattern includes the step of ejecting a plurality of liquid droplets of a function liquid at predetermined pitches between banks, wherein each of the predetermined pitches is larger than a diameter of the liquid droplet and the predetermined pitches are set so that adjacent liquid droplets coalesce with each other when wetting and spreading within a groove formed between the banks.

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